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<gallery mode="packed" widths=400px heights=400px> |
<gallery mode="packed" widths=400px heights=400px> |
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Image:tf01.png|''[[|Local resistance through a tunnel barrier (Lévy flights, CTAFM)]]'' |
Image:tf01.png|''[[|Local resistance through a tunnel barrier (Lévy flights, CTAFM)]]'' |
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Image:tf02.png|''[[ |
Image:tf02.png|''[[|Atomic steps of an oxide substrate (AFM)]]'' |
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Image:tf03.jpg|''[[ |
Image:tf03.jpg|''[[|Atomic steps of an oxide substrate (AFM)]]'' |
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Image:tf04.jpg|''[[ |
Image:tf04.jpg|''[[|Thin film oxide (AFM)]]'' |
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Image:tf05.jpg|''[[ |
Image:tf05.jpg|''[[|Oxide nanocomposite (AFM)]]'' |
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Image:tf19b.jpg|''[[ |
Image:tf19b.jpg|''[[|Self-assembled epitaxial vertically aligned structures of La2CoMnO6-ZnO (TEM)]]'' |
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Image:tf06.jpg|''[[ |
Image:tf06.jpg|''[[|Two-dimensional electron gas at the interface]]'' |
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Image:tf07.jpg|''[[ |
Image:tf07.jpg|''[[|Electron lithography for spin-FET]]'' |
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Image:tf08.jpg|''[[ |
Image:tf08.jpg|''[[|Electron lithography for spin-FET]]'' |
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Image:tf09.jpg|''[[ |
Image:tf09.jpg|''[[|Selected area diffraction of SnTiO3 film (TEM)]]'' |
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Image:tf10.jpg|''[[ |
Image:tf10.jpg|''[[|RHEED image of an epitaxial thin film]]'' |
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Image:tf11.jpg|''[[ |
Image:tf11.jpg|''[[|RHEED image of an epitaxial thin film]]'' |
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Image:tf12.jpg|''[[ |
Image:tf12.jpg|''[[|Cross-section of a LaAlO3/SrTiO3 interface (HRTEM)]]'' |
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Image:tf13.jpg|''[[ |
Image:tf13.jpg|''[[|c-Si solar cell made in MaCEPV]]'' |
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Image:tf14.jpg|''[[ |
Image:tf14.jpg|''[[|St John's college, Cambridge]]'' |
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Image:tf15.jpg|''[[ |
Image:tf15.jpg|''[[|Taiwan Synchrotron]]'' |
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Image:tf16.jpg|''[[ |
Image:tf16.jpg|''[[|US boats with PV and wind]]'' |
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Image:tf17b.jpg|''[[ |
Image:tf17b.jpg|''[[|Nanopatterned diode (FIB)]]'' |
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Image:tf18.jpg|''[[ |
Image:tf18.jpg|''[[|Encapsulant functionalised with photon conversion]]'' |
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Image:Tf20b.jpg|''[[ |
Image:Tf20b.jpg|''[[|Plasma during pulsed laser deposition (PLD)]]'' |
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</gallery> |
</gallery> |