logo université de Strasbourg logo CNRS logo INSA Strasbourg logo ENGEES

Équipe MATISEN: Matériaux pour les technologies de l’information, les capteurs et la conversion d’énergie.

« Gallery Thomas Fix » : différence entre les versions

De Équipe MATISEN: Matériaux pour les technologies de l’information, les capteurs et la conversion d’énergie.
Aller à la navigation Aller à la recherche
Aucun résumé des modifications
Aucun résumé des modifications
Ligne 1 : Ligne 1 :
<gallery mode="packed" widths=400px heights=400px>
<gallery mode="packed" widths=400px heights=400px>
Image:tf01.png|''Local resistance through a tunnel barrier (Lévy flights, CTAFM)''
Image:tf01.png|''Local resistance through a tunnel barrier (Lévy flights, CTAFM)''
Image:tf02.png|''[[|Atomic steps of an oxide substrate (AFM)]]''
Image:tf02.png|''Atomic steps of an oxide substrate (AFM)''
Image:tf03.jpg|''[[|Atomic steps of an oxide substrate (AFM)]]''
Image:tf03.jpg|''Atomic steps of an oxide substrate (AFM)''
Image:tf04.jpg|''[[|Thin film oxide (AFM)]]''
Image:tf04.jpg|''Thin film oxide (AFM)''
Image:tf05.jpg|''[[|Oxide nanocomposite (AFM)]]''
Image:tf05.jpg|''Oxide nanocomposite (AFM)''
Image:tf19b.jpg|''[[|Self-assembled epitaxial vertically aligned structures of La2CoMnO6-ZnO (TEM)]]''
Image:tf19b.jpg|''Self-assembled epitaxial vertically aligned structures of La2CoMnO6-ZnO (TEM)''
Image:tf06.jpg|''[[|Two-dimensional electron gas at the interface]]''
Image:tf06.jpg|''Two-dimensional electron gas at the interface''
Image:tf07.jpg|''[[|Electron lithography for spin-FET]]''
Image:tf07.jpg|''Electron lithography for spin-FET''
Image:tf08.jpg|''[[|Electron lithography for spin-FET]]''
Image:tf08.jpg|''Electron lithography for spin-FET''
Image:tf09.jpg|''[[|Selected area diffraction of SnTiO3 film (TEM)]]''
Image:tf09.jpg|''Selected area diffraction of SnTiO3 film (TEM)''
Image:tf10.jpg|''[[|RHEED image of an epitaxial thin film]]''
Image:tf10.jpg|''RHEED image of an epitaxial thin film''
Image:tf11.jpg|''[[|RHEED image of an epitaxial thin film]]''
Image:tf11.jpg|''RHEED image of an epitaxial thin film''
Image:tf12.jpg|''[[|Cross-section of a LaAlO3/SrTiO3 interface (HRTEM)]]''
Image:tf12.jpg|''Cross-section of a LaAlO3/SrTiO3 interface (HRTEM)''
Image:tf13.jpg|''[[|c-Si solar cell made in MaCEPV]]''
Image:tf13.jpg|''c-Si solar cell made in MaCEPV''
Image:tf14.jpg|''[[|St John's college, Cambridge]]''
Image:tf14.jpg|''St John's college, Cambridge''
Image:tf15.jpg|''[[|Taiwan Synchrotron]]''
Image:tf15.jpg|''Taiwan Synchrotron''
Image:tf16.jpg|''[[|US boats with PV and wind]]''
Image:tf16.jpg|''US boats with PV and wind''
Image:tf17b.jpg|''[[|Nanopatterned diode (FIB)]]''
Image:tf17b.jpg|''Nanopatterned diode (FIB)''
Image:tf18.jpg|''[[|Encapsulant functionalised with photon conversion]]''
Image:tf18.jpg|''Encapsulant functionalised with photon conversion''
Image:Tf20b.jpg|''[[|Plasma during pulsed laser deposition (PLD)]]''
Image:Tf20b.jpg|''Plasma during pulsed laser deposition (PLD)''
</gallery>
</gallery>

Version du 17 avril 2020 à 16:26